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New technique for repairing opaque defects

机译：修复不透明缺陷的新技术

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Abstract: In order to repair opaque defects using a focused ion beam instrument that utilizes a Ga ion source, the excess film must be removed by sputter etching. Unfortunately, this method of repairing opaque defects does have several drawbacks. The first and foremost problem is the occurrence of the so called 'river bed', which greatly limits the effectiveness of the FIB mask repair instrument. We have found, however, that by using a new gas assisted etching procedure, the size of river beds can be reduced substantially, while simultaneously producing several other favorable effects. By introducing a new gas, the etching rate for chromium is enhanced 1.26 times, and the etching rate for quartz substrate is reduced 0.28 times. Therefore, the damage to the quartz substrate is reduced by 0.22 times over that found when no gas is used. In addition, the favorable effects make it possible to terminate etching on the quartz substrate, producing a noticeably flat chrome removed surface with little Ga staining. We evaluated the repaired masks using an inspection system, and then examined their printability using an I-line stepper. We obtained highly favorable results on both accounts.!1
机译：摘要：为了使用利用Ga离子源的聚焦离子束仪器修复不透明缺陷，必须通过溅射蚀刻去除多余的薄膜。不幸的是，这种修复不透明缺陷的方法确实存在一些缺陷。第一个也是最重要的问题是所谓“河床”的出现，这大大限制了FIB面罩维修工具的有效性。然而，我们发现，通过使用新的气体辅助蚀刻程序，可以大大减小河床的尺寸，同时产生其他一些有利的效果。通过引入新的气体，铬的蚀刻速率提高了1.26倍，石英基板的蚀刻速率降低了0.28倍。因此，与不使用气体时相比，对石英基板的损坏减少了0.22倍。另外，良好的效果使得可以终止在石英基板上的蚀刻，从而产生几乎没有Ga污染的明显平坦的铬去除表面。我们使用检查系统评估了修复后的口罩，然后使用I线步进器检查了其可印刷性。我们两个帐户都获得了非常满意的结果。！1

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