Abstract: Laser-based mask inspection systems are indispensable to attaining better yield, in both the semiconductor manufacturing process and the mask manufacturing process, because of their high throughput. We describe this issue citing the operational principle of our AM-601D (A reticle particle inspection system that we manufacture, rated sensitivity: 0.5 micron), which is based on a spatial filtering method with a raster scanning of a focused laser beam.!7
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