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首页> 外文会议>Fusion Engineering, 2002. 19th Symposium on >Boronization using deuterated-decaborane in JT-60U
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Boronization using deuterated-decaborane in JT-60U

机译：在JT-60U中使用氘代十硼烷进行硼化

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In JT-60U, boronization using hydride-decaborane (B/sub 10/H/sub 14/) vaporization has been conducted for the first wall conditioning. Compared to other discharge cleaning, boronization is claimed to be efficient in reduction of both oxygen impurities and hydrogen recycling in plasma. However, there are a few issues for reducing of hydrogen included in boron film and for stabilizing of DC glow discharge cleaning (GDC) during the boronization. To solve the issues, a new boronization method using deuterated-decaborane (B/sub 10/D/sub 14/) was adopted instead of the conventional B/sub 10/H/sub 14/. As a result, hydrogen content in the boron film decreased clearly, and the discharge conditioning shots for decreasing hydrogen concentration in plasmas after the boronization was reduced to 1/10 in comparison to the conventional process. Furthermore, GDC became stable, with only helium dilution gas, and it was possible to save 30 hours in maximum of the time necessary for boronization. It was found that the boronization using B/sub 10/D/sub 14/ is very efficient and effective method for the first wall conditioning.
机译：在JT-60U中，已经进行了使用氢化物​​-十硼烷（B / sub 10 / H / sub 14 /）汽化的硼化处理，以进行第一次壁调节。与其他放电清洁相比，硼化被认为可以有效减少等离子体中的氧杂质和氢循环。然而，在硼化过程中，存在一些用于减少硼膜中所含的氢并稳定DC辉光放电清洁（GDC）的问题。为了解决该问题，采用了一种新的使用氘化十硼烷的硼化方法（B / sub 10 / D / sub 14 /），而不是常规的B / sub 10 / H / sub 14 /。结果，与常规方法相比，硼膜中的氢含量明显降低，并且用于降低硼化后的等离子体中的氢浓度的放电调节量降低至1/10。此外，仅用氦稀释气体，GDC变得稳定，并且可以最多节省30个小时的硼化时间。已经发现，使用B / sub 10 / D / sub 14 /进行的硼化是非常有效的第一壁调理方法。

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