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首页> 外文会议>Conference on Photomask Technology; 20060919-22; Monterey,CA(US) >An effective layout optimization method via LFD concept
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An effective layout optimization method via LFD concept

机译：通过LFD概念的有效布局优化方法

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摘要

As the advent of advanced process technology such as 65nm and below, the designs become more and more sensitive to the variation of manufacturing process. Though the complicated design rules can guarantee process margin for the most layout environments, some layouts that pass the DRC still have narrow process windows. An effective layout optimization approach based on Litho Friendly Design (LFD), one of Mentor Graphics' products, was introduced to enhance design layout manufacturability. Additional to process window models and production proven Optical Proximity Correction (OPC) recipes, the LFD design kits are also generated and needed, which with the kits and rules people should guarantee no process window issues in a design if the design passes the check of these rules via the kits. Lastly, a real 65nm product Metal layer was applied full chip OPC and post-OPC checks to process variation. Some narrow process window layouts were detected and identified, then optimized for larger process window based on the advices provided by LFD. Both simulation and in-line data showed that the DOFs were improved after the layout optimization without changing the area, timing and power of the original design.
机译：随着诸如65nm及以下的先进工艺技术的出现，设计对制造工艺的变化越来越敏感。尽管复杂的设计规则可以确保大多数布局环境的工艺裕量，但某些通过DRC的布局仍具有狭窄的工艺窗口。引入了一种基于Mentor Graphics产品之一的Litho Friendly Design（LFD）的有效布局优化方法，以增强设计布局的可制造性。除了工艺窗口模型和经过生产验证的光学邻近校正（OPC）配方以外，还生成并需要LFD设计套件，如果设计通过了对这些检查和检查，则人们应保证使用该套件和规则可以保证设计中没有工艺窗口问题套件中的规则。最后，将真正的65nm产品金属层应用于全芯片OPC和OPC后检查以处理工艺变化。检测并识别出一些狭窄的过程窗口布局，然后根据LFD提供的建议针对较大的过程窗口进行优化。仿真和在线数据均表明，在优化布局之后，自由度得到了改善，而没有改变原始设计的面积，时序和功耗。

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