PGSD is one of the solutions as a developer of 70 nm node generation mask fabrication. To make 55 nm node generation mask, CD error induced by loading effect (loading-effect-induced CD error) must be reduced. As is generally known, primary cause of loading effect is dissolution products that hinder the progress of development.We think that it is the key in development technology to control movement of dissolution products and to disperse dissolution products uniformly for minimizing the loading-effect-induced CD error.In this paper, we propose a new concept and procedure to optimize the movement direction and the amount of dissolution products.
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