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首页> 外文会议>Conference on Photomask Technology; 20060919-22; Monterey,CA(US) >Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system
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Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system

机译：使用EBM书写系统评估OPC技术的一两次传递的书写策略

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Evaluation of the writing strategy effects with one and two pass exposed by EBM-4000 variable-shaped e-beam lithography tool is a new class of mask making especially for OPC technology. The EBM-4000 writing system features a variable shaped beam, 50 KeV accelerating voltage, a continuous stage, and incorporates some technologies. Obviously, many examples exist of systems which add parallelism to the exposure process by using multiple pass. The standard writing strategy of EBM-4000 writing system is four pass. We evaluated and confirmed the two pass exposed by EBM-4000 writing system for 90 to 130 nm node successfully. The results of the two pass improved throughput and had excellent performances. In the present paper, the one and two pass exposed by EBM-4000 writing system has been investigated. The objective of the present work is to direct the performances for several design of OPC verification like serifs and jogs. We will provide the actual measurement data and images obtained on CD-SEM for the OPC pattern exposed with one and two pass. In this paper, the characterization data will also present the applicable results such as resolution, position accuracy, global and local CD uniformity, CD linearity, and roughness. We have evaluated and confirmed the one and two pass writing strategies for the EBM-4000 writing system. The writing strategies are especially desirable for unique properties due to the best conditions of the CAR process.
机译：用EBM-4000可变形状电子束光刻工具曝光一遍和两遍就可以评估书写策略效果，这是一类专门针对OPC技术的新型掩模。 EBM-4000书写系统具有可变形状的光束，50 KeV的加速电压，连续的载物台，并结合了一些技术。显然，存在许多通过使用多次通过向曝光过程添加并行性的系统的示例。 EBM-4000书写系统的标准书写策略是四次通过。我们评估并确认了通过EBM-4000写入系统成功曝光90至130 nm节点的两次通过。两次通过的结果提高了吞吐量，并具有出色的性能。本文研究了EBM-4000写入系统曝光的一遍和两遍。当前工作的目的是指导几种OPC验证设计（例如衬线和点动）的性能。我们将提供通过一遍和两遍曝光的OPC图案的实际测量数据和在CD-SEM上获得的图像。在本文中，表征数据还将提供适用的结果，例如分辨率，位置精度，整体和局部CD均匀性，CD线性和粗糙度。我们已经评估并确认了EBM-4000书写系统的一遍和两遍书写策略。由于CAR工艺的最佳条件，对于独特的属性，写入策略特别理想。

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