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Effects of Ta on the Microstructure and Magnetic Properties of FePt Thin Films

机译:Ta对FePt薄膜微结构和磁性能的影响

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We have studied the effect of Ta on the structure, magnetic properties and the ordering temperature of FePt(Ta) thin films. The samples are prepared by the dc and rf magnetron cosputtering method with 3 single element targets. After a deposition, the samples are annealed in a vacuum at various temperatures. The XRD patterns show strong (111) peaks at all annealing temperatures, but the change in the d-spacings reveals a disorder-order transformation. The more Ta is added to the FePt, the larger the coercivity becomes. The coercivity of the FePtTa40W film annealed at 700°C reaches about two times as large as the value of the pure FePt film. The delta m curves imply that Ta atoms diffuse into the grain boundary to reduce inter-granular exchange coupling, which leads the enhancement of coercivity.
机译:我们研究了Ta对FePt(Ta)薄膜的结构,磁性能和有序化温度的影响。样品是通过直流和射频磁控共溅射方法制备的,具有3个单元素靶。沉积后,将样品在真空中于各种温度下退火。 XRD图谱在所有退火温度下均显示出很强的(111)峰,但d间距的变化显示出无序有序的转变。添加到FePt中的Ta越多,矫顽力越大。在700°C退火的FePtTa40W薄膜的矫顽力约为纯FePt薄膜的矫顽力的两倍。 δm曲线暗示Ta原子扩散到晶界以减少晶间交换耦合,从而导致矫顽力的提高。

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