In-Situ Ellipsometry on Thin Vacuum Deposited Films

机译：真空沉积薄膜上的原位椭偏

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1. It is possible to use an eliipsometer in R2R production environments. 2. Ellipsometry can be used in both fast and slow coating machines. 3. We can measure optical data and thickness values below 50 nm. 4. Ellipsometry can be used for closed loop thickness and distribution control.

机译：1.可以在R2R生产环境中使用高度计。 2.椭偏仪可用于快速和慢速涂布机。 3.我们可以测量低于50 nm的光学数据和厚度值。 4.椭偏仪可用于闭环厚度和分布控制。

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《Fall Technical Conference of the Association of Industrial Metallizers, Coaters and Laminators 2007 and 21st International Vacuum Web Coating Conference》|2007年|P.107411011104|共3页
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P. Sauer; H.-G.Lotz; R. Kukla; G. Steiniger; J. Schroeder;
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中图分类涂料工业;
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入库时间 2022-08-26 14:13:46

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In-Situ Ellipsometry on Thin Vacuum Deposited Films

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