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Analysis of AttPSM CD Control: Mask Bias and Flare Effects

机译：AttPSM CD控制分析：蒙版偏差和眩光效果

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Small MEEF is important as well as a large process window to control dense line CD variation. The MEEF and the process window are both strong functions of mask bias. In this study, MEEF and process windows were analyzed mainly with 100nm node dense lines with varied mask bias using 9% attPSM and conventional binary mask. Illumination influences were also analyzed. Flare is one of the big concerns of the lithographic performance, but its influences are not well understood. Long range flare was also studied in terms of CD control. Flare definitely reduces the process window, but has no influence on MEEF. A systematic analysis was done in order to explain the results.
机译：小型MEEF和大型工艺窗口对于控制密集线CD的变化都很重要。 MEEF和工艺窗口都是掩模偏置的强大功能。在这项研究中，MEEF和工艺窗口主要使用100％节点密集线（具有9％atPSPSM和常规二进制掩模）以及不同的掩模偏置进行分析。还分析了照明的影响。耀斑是光刻性能的主要问题之一，但其影响尚不十分清楚。还从CD控制方面研究了远距离耀斑。 Flare无疑会减小过程窗口，但不会影响MEEF。为了解释结果进行了系统的分析。

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