Recently, in high precision positioning field, the improvement of the positioning accuracy is required for the development of the next generation technology like nano-technology. In many industry application machines, we can often see the repetitive operation [?]. For the repetitive position command of the positioning machine, the investigation for the suppression of the repetitive tracking error using iterative learning control (ILC) is increasing. For above reasons, the purpose of this paper is improvement of the positioning accuracy in the high-speed repetitive position command. The plant is the Piezo-scanner of the atomic force microscope which is not only used for measurement device but nano-manipulation. the requirement of positioning accuracy of the AFM is nano-scale. In ILC, the inverse system of the plant is often used as the learning filter. This design of the learning filter using the inverse system is most important part in ILC system design. Thus, there are many methods of the inverse system design. In this paper, the ILC using the perfect inverse system of the plant which based on the perfect tracking control is proposed. Its proposed inverse system of the plant is the perfect inverse system of the plant, and the all poles of the proposed inverse system of the plant can be located on the origin in discrete-time domain. Thus, the proposed inverse plant has good characteristics for ILC system. In this paper, the effectiveness of the proposed method is shown by the some simulations and experimental results.
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