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Size effects of microstructure during plasma immersion ion implantation

机译:等离子体浸没离子注入过程中微观结构的尺寸效应

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Plasma immersion ion implantation (PBII) has been regarded as an effective tool to enhance surface properties. The implantation dynamics during plasma ion implantation of small component used in micro-electromechanical systems (MEMS) has seldom been investigated. Numerical simulation of PBII by Particle-in-cell/Monte Carlo collision method has been launched to understand the effect of small target dimension. As the characteristic size of the component decreases, the electric field strength near the top surface increases and the thickness of plasma sheath also decreases with a higher impact energy. In summary the implantation efficiency increases significantly.
机译:等离子体浸没离子注入(PBII)被认为是增强表面性能的有效工具。很少研究微机电系统(MEMS)中使用的小部件的等离子体离子注入过程中的注入动力学。为了了解小目标尺寸的影响,已经开始通过粒子内/蒙特卡洛碰撞法对PBII进行数值模拟。随着部件的特征尺寸减小,顶表面附近的电场强度增大,并且等离子体鞘的厚度也随着较高的冲击能而减小。总之,植入效率显着提高。

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