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首页> 外文会议>IEEE Regional Symposium on Micro and Nano Electronics >Fabrication of gold strip thin film on glass substrate for plasmonic demodulation application
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Fabrication of gold strip thin film on glass substrate for plasmonic demodulation application

机译：在玻璃基板上制备用于等离子体解调的金带薄膜

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Plasmonic demodulation is a process where an optical signal due to the generation of surface plasmon polaritons (SPP) reacts with electrical domain, resulted an inverse relationship between them. In this study, fabrication processes of gold strip thin films on the glass substrates are presented. For an optimization purpose of electro-optics effect observation, the width of gold strip thin film is set as 0.5mm, which is equal to the laser beam spot diameter. First, the strip pattern is printed on a commercial transparent plastic slide. The pattern transfer process from plastic slide to glass slide is performed using UV light. Once the pattern is formed on the glass substrate, gold thin film with varies thicknesses namely 30nm, 50nm and 100nm are deposited by monitoring the sputtering time; via d.c. sputtering on the glass substrate which is partly coated with the positive photoresist. The photoresist is removed by immersing the coated glass slide in acetone solution for 15 minutes, follow with DI water for three seconds in an ultrasonic bath. This yields to the establishment of gold strip thin films with dimension of width 0.5mm × length 10mm. An optimal plasmonic demodulation process is successfully acquired by using gold metal strip with thickness of 30nm and higher laser power level, namely P=1.5mW. In a conclusion, we believe that the output of this study will contribute a significant impact to the development of the plasmonic demodulator as an active device.
机译：等离子解调是由于表面等离激元极化子（SPP）的产生而引起的光信号与电畴反应，从而导致它们之间成反比关系的过程。在这项研究中，提出了在玻璃基板上的金条薄膜的制造工艺。为了优化电光效果观察，将金带薄膜的宽度设置为0.5mm，该宽度等于激光束光斑直径。首先，将条形图案印刷在商业透明塑料载玻片上。从塑料载玻片到玻璃载玻片的图案转移过程是使用紫外线进行的。在玻璃基板上形成图案后，通过监测溅射时间，可以沉积厚度分别为30nm，50nm和100nm的金薄膜。通过直流在部分涂覆有正性光刻胶的玻璃基板上进行溅射。通过将涂覆的载玻片浸入丙酮溶液中15分钟，然后在超声波浴中加入去离子水3秒钟，去除光刻胶。这产生了尺寸为宽度0.5mm×长度10mm的金带薄膜。通过使用厚度为30nm且具有较高激光功率水平（即P = 1.5mW）的金金属带，成功获得了最佳的等离子体解调工艺。总而言之，我们相信这项研究的结果将对等离子解调器作为有源器件的发展产生重大影响。

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