Study of via layer overlay control in BEOL trench-first approach

机译：BEOL沟槽优先方法中的通孔层覆盖控制研究

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This paper presents our work on the study of controlling via layer overlay to two neighboring metal layers in BEOL trench first approach, mainly including how to effectively analyze the overlay measurement results and use them for overlay compensation during exposure process.

机译：本文介绍了我们在BEOL沟槽优先方法中控制通孔层覆盖两个相邻金属层的研究工作，主要包括如何有效地分析覆盖测量结果并将其用于曝光过程中的覆盖补偿。

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《China Semiconductor Technology International Conference》|2016年|1-3|共3页
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Bin Xing; Qiang Zhang; Qiang Wu;
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Study of via layer overlay control in BEOL trench-first approach

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