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OPC convergence improvement by matrix OPC solver on high MEEF contact layer

机译：在高MEEF接触层上通过矩阵OPC求解器改善OPC收敛

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摘要

The use of dense pitch and single exposure process make 28nm contact layer known as one high MEEF (Mask Error Enhancement Factor) and low contrast layer, which also causes slow and poor OPC convergence. Traditional OPC method only considers edge placement error itself to determine its fragment's movement at each iteration. It becomes unadaptable for dense and high MEEF layout for 28nm node and beyond. Instead, matrix OPC solver is a more advanced OPC algorithm that takes neighboring segments' movement into account at each iteration. For each fragment on the chip, the impact of every neighbor fragment's movement is computed. In this paper, matrix OPC solver benefit is investigated and analyzed based on some typical Contact layouts with high MEEF. The result shows better OPC convergence can be obtained even with less OPC iterations.
机译：密集间距和单次曝光工艺的使用使28nm接触层被称为一层高MEEF（面膜误差增强因子）和低对比度层，这也导致了缓慢且较差的OPC会聚。传统的OPC方法仅考虑边缘放置错误本身来确定其片段在每次迭代中的运动。它变得不适用于28nm及更高节点的密集且高MEEF布局。取而代之的是，矩阵OPC求解器是一种更高级的OPC算法，该算法在每次迭代时都会考虑相邻段的运动。对于芯片上的每个片段，都会计算每个相邻片段移动的影响。本文基于一些具有较高MEEF的典型触点布局，研究并分析了矩阵OPC求解器的优势。结果表明，即使OPC迭代次数更少，也可以获得更好的OPC收敛性。

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