首页> 外文会议>Electronic Components and Technology Conference, 1995. Proceedings., 45th >Investigation on the effect of copper leadframe oxidation onpackage delamination
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Investigation on the effect of copper leadframe oxidation onpackage delamination

机译:铜引线框架氧化对铜的影响的研究包装脱层

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The presence of a copper oxide layer on the leadframe of plasticIC packages was found to cause delamination at the diepad/mold compoundinterface. The failure mechanism seems to be the presence of voids atthe oxide/metal interface, which increased as the degree of oxidationwas increased. Elevated temperature processes used in assembly such asdie attach curing and wire bonding were found to be the primary causesof oxidation. However, an important observation was made in that theduration of post mold curing was also found to have a great impact onthe interfacial integrity of the oxidized interface within anencapsulated package. Depending on the degree of oxidation and theduration of post mold curing, the susceptibility of the packagedelamination during solder reflow was found to shift from diepad/compound interface to die attach region. This paper also describes anovel method of characterising oxidation using SIMS (Secondary Ion MassSpectroscopy) depth profiling. SEM (Scanning Electron Microscopy) andXPS (X-ray Photoelectron Spectroscopy) was used to characterise oxidemorphology and oxide composition change on the samples. In parallel, theadhesion strength of the oxidized copper leadframe to a mold compoundwas characterised using an adhesion test. These data were correlated tothe degree of package delamination on a QFP package using C-modeScanning Acoustic Microscopy. This work shows that it is important tocontrol the oxide thickness on the copper leadframe die pad for improvedpackage integrity, especially when larger die pad sizes are considered
机译:塑料引线框架上存在氧化铜层 发现IC封装在芯片焊盘/模具化合物处引起分层 界面。失效机制似乎是在 氧化物/金属界面,随着氧化程度的增加而增加 增加了。装配中使用的高温过程,例如 发现芯片固着固化和引线键合是主要原因 氧化。但是,有一个重要的发现是 模具后固化的时间也被发现对模具的影响很大。 内部氧化界面的界面完整性 封装的软件包。取决于氧化程度和 模具后固化的持续时间,包装的敏感性 发现焊料回流期间的分层从芯片转移 焊盘/化合物接口到芯片附着区域。本文还介绍了 SIMS(二次离子质量)表征氧化的新方法 光谱)深度剖析。 SEM(扫描电子显微镜)和 XPS(X射线光电子能谱)用于表征氧化物 样品的形态和氧化物组成发生变化。同时, 氧化铜引线框与模塑料的粘合强度 使用附着力测试进行表征。这些数据与 使用C模式的QFP封装上的封装分层程度 扫描声学显微镜。这项工作表明, 控制铜引线框架管芯焊盘上的氧化物厚度以改善 封装完整性,特别是在考虑更大的芯片焊盘尺寸时

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