【24h】

A Novel Capacitance-Match Method for EAS Responder

机译:EAS应答器电容匹配的新方法

获取原文

摘要

A novel manufacture technology in regard to EAS responder of conductive ink was introduced. According to its operating principle, running characteristics of recovery and puncturing responder were analyzed as well as a calculation for parasitic and tuning capacitance. In addition, a new match technology was provided for retrievable parasitic capacitance. Also, the capacitance structure of the response flat and the puncturing mechanism were studied connected with alarge number of data, which provided a manufacture method for the puncturing responder based on this excellent match.
机译:介绍了一种有关导电油墨EAS响应器的新颖制造技术。根据其工作原理,分析了恢复和击穿响应器的运行特性,并计算了寄生和调谐电容。此外,还提供了一种新的匹配技术,用于可回收的寄生电容。另外,结合大量数据对响应平面的电容结构和穿刺机制进行了研究,为基于这种良好匹配的穿刺响应器的制造方法提供了一种方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号