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Low Thermal Budget Amorphous Indium Tungsten Oxide Nano-Sheet Junctionless Transistors with Near Ideal Subthreshold Swing

机译:具有接近理想亚阈值摆幅的低热预算非晶氧化铟锡纳米片无结晶体管

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Amorphous indium tungsten oxide (a-IWO) nano-sheet (NS) junctionless (JL) transistors (a-IWO NS-JLTs) have been successfully fabricated and demonstrated in the category of indium oxide based thin film transistors (TFTs). We have scaled down thickness of a-IWO channel to 4nm. The proposed a-IWO NS-JLTs with low operation voltages exhibit good electrical characteristics: near ideal peak subthreshold swing (S.S.) ~ 63mV/dec., high field-effect mobility (μFE) ~ 25.3 cm2/V-s. The novel a-IWO NS-JLTs with low temperature processes are promising candidates for monolithic three-dimensional integrated circuits (3-D ICs), vertical stacked (VS) hybrid CMOS technology, and large-scale integration (LSI) applications in the future.
机译:非晶铟氧化钨(a-IWO)纳米片(NS)无结(JL)晶体管(a-IWO NS-JLTs)已成功制造,并在基于氧化铟的薄膜晶体管(TFT)类别中得到了证明。我们已经将a-IWO通道的厚度缩减至4nm。拟议的低工作电压a-IWO NS-JLT具有良好的电气特性:接近理想峰值亚阈值摆幅(S.S.)〜63mV / dec。,高场效应迁移率(μ FE )〜25.3厘米 2 / V-s。具有低温工艺的新型a-IWO NS-JLT有望成为单片三维集成电路(3-D IC),垂直堆叠(VS)混合CMOS技术以及未来大规模集成(LSI)应用的候选产品。

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