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Performance analysis of Vertical Photodetector for Efficient on Chip Optical Interconnect

机译:垂直光电探测器高效芯片光学互连的性能分析

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In this work, the optical absorption analysis of the Vertical Photodetector for Optical Interconnect is done. For efficient detection of the signal at the receiver, a photodetector is required for designing of efficient optical interconnects. The light transmitted from the optical source is coupled into the waveguide and received by the detector. Vertical photodetector can be designed using Si and Ge but due to large bandgap. Si can't detect the optical signal efficiently at wavelengths used for optical communication (1.3 to 1.55 μm). This can be done by using smaller band gap material (Ge) to design a photo- detector. Ge photo- detector offer high performance optical interface solutions The Optical absorption property of photodetector is analyzed using Lumerical FDTD. It is observed that the absorption rate of vertical Ge-Si photodetector vary in different plane and provides high responsivity at 1.55 μm because the region of absorption can be made longer to enable full absorption. We investigate the absorption rate of the designed vertical photodetector because the responsivity of the photodetector depends on the absorption rate. The designed structure can be used in on-chip optical interconnect with high absorption rate and low cost.
机译:在这项工作中,完成了用于光学互连的垂直光电探测器的光学吸收分析。为了有效地检测接收器处的信号,需要光电探测器来设计有效的光学互连。从光源传输的光耦合到波导中并由检测器接收。垂直光电探测器可以使用Si和Ge设计,但由于大带隙。 Si无法在用于光通信的波长(1.3至1.55μm)的波长下有效地检测光信号。这可以通过使用较小的带隙材料(GE)来设计光学检测器。 GE Photo-Detector提供高性能光学接口解决方案,使用Lumerical FDTD分析光电探测器的光学吸收性能。观察到,垂直Ge-Si光电探测器的吸收率在不同的平面中变化,并且在1.55μm处提供高响应度,因为可以使吸收区域更长时间以实现全面吸收。我们研究了设计的垂直光电探测器的吸收率,因为光电探测器的响应性取决于吸收率。设计的结构可用于片上吸收率和低成本的片上光学互连。

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