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首页> 外文会议>International conference on high temperature materials chemistry >The Reaction Between Chlorcarbon Vapors and V_2O_5 Between 475K and 875K
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The Reaction Between Chlorcarbon Vapors and V_2O_5 Between 475K and 875K

机译：氯碳蒸气与475K和875K之间的反应蒸气和V_2O_5

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The reactions between tetrachloromethane, 1,2-dichloroethane, or chlorobenzene and V_2O_5 have been investigated by flowing the chlorocarbon through a bed of powdered V2O_5 in vacuo at temperatures between 475 K and 875 K. Evolved gas analysis-Fourier transform infrared spectroscopy was used to monitor the progress of the reaction. CCl_4 reacted nearly quantitatively with excess V_2O_5 to produce CO_2 and VOCl_3 and traces of COCl_2 and HCl. Extent of reaction/ temperature profiles showed that COCl_2 was a reaction intermediate. Hydrolysis of the VOCl_3 by traces of water in the system probably produced the HCl. CCl_4 reacted following 0.5 order kinetics with an activation energy of 78 +- 5 kJ/ mol. The reaction between V_2O_5 and 1,2-dichloroethane followed at least two different pathways. The first produced CO_2, H_2O, and HCl as the final products. Ethanal was observed as an intermediate in this reaction sequence. The second produced vinyl chloride. In addition, ethene was observed if reduced vanadium oxides were present in the reaction mixture. The 1,2-dichloroethane followed second order kinetics and had an apparent activation energy of 135 +- 10 kJ/ mol. Chlorobenzene also reacted with V_2O_5 in this temperature region. However, the reaction is much less efficient and probably would not be suitable for remediation applications.
机译：四氯甲烷，1,2-二氯乙烷或氯苯和V_2O_5之间的反应已经通过在475 K和875 K.逸出气体分析傅立叶之间的温度下的粉末状V2O_5在真空中的一个床中流动的含氯烃变换红外光谱法用于监测反应的进展。 CCL_4几乎定量地用过量的V_2O_5反应，以产生CO_2和VOCL_3和COCl_2和HCl的痕迹。反应/温度曲线的程度显示COCl_2是反应中间体。通过系统中的水痕迹水解VOCL_3可能产生HCl。 CCL_4在0.5阶动力学后反应，活化能量为78 + - 5 kJ / mol。 V_2O_5和1,2-二氯乙烷之间的反应遵循至少两种不同的途径。第一个生产的CO_2，H_2O和HCL作为最终产品。在该反应序列中观察到乙醇作为中间体。第二种产生的氯乙烯。此外，如果在反应混合物中存在还原钒氧化物，则观察到乙烯。 1,2-二氯乙烷次遵循二阶动力学，表观活化能量为135±10 kJ / mol。氯苯也与该温度区域的V_2O_5反应。然而，反应效率低得多，可能不适合修复应用。

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