Future manufacturing on atomic scale will imply a metrology that no longer relies on common roughness parameters but considers atomic features, e.g. the crystal structure of the surface, the location of atomic point defects and cluster formations. In this paper a new method to extract these functional and structure oriented surface characteristics is proposed. It is based on the discrete analysis of continuous data measured by STM or AFM. Instead of analysing continuous data and calculating two- and three-dimensional parameters like RMS, R_(a), S_(q) and S_(z) by intersecting the surface, mathematical and image processing methods are applied to the STM and AFM images to achieve functional and structural data.
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