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首页> 外文会议>International Congress on Applications of Lasers and Electro-Optics >GENERATION OF INTENSE VACUUM ULTRAVIOLET RADIATIONS FOR ADVANCED MATERIALS PROCESSING
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GENERATION OF INTENSE VACUUM ULTRAVIOLET RADIATIONS FOR ADVANCED MATERIALS PROCESSING

机译：发电强度真空紫外线辐射，用于先进材料加工

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We have been developing high intensity vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate an output energy of sub mJ with a pulse width of subpicosecond at the wavelength of 126nm. A seed pulse was generated in Xe as the 7th harmonics of a 882 nm Ti:sapphire laser, and the (Ar{sub}2){sup}* amplifier media were generated in an optical-field-induced ionization Ar plasma produced by another 785 nm Ti:sapphire laser. The VUV radiation should be further amplified in a discharge-pumped (Ar{sub}2){sup}* amplifier, which is under construction.
机译：我们一直在开发高强度真空紫外线（VUV）激光系统，可用于微观和精确加工和光化学反应等先进应用。我们提出并构建了一种新的VUV激光系统，以产生子MJ的输出能量，其中脉冲宽度为126nm的波长。在XE中产生种子脉冲作为882nm ti：蓝宝石激光器的第7次谐波，以及（Ar {sub} 2）{sup} *放大介质在另一个产生的光场诱导的电离Ar等离子体中产生785 nm ti：蓝宝石激光。在正在构建的放电泵浦（AR {Sub} 2）{Sup} *放大器中，应进一步放大VUV辐射。

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