Novel methodology for photo condition optimization through simulation

机译：通过仿真进行照片条件优化的新型方法

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摘要

In photo process development, simulation plays a very important role to optimize the photo condition prior to exposure wafers. In this report we would address a systematic methodology to accelerate the photo condition optimization through simulation with the aids of statistical methods. Moreover, this systematic methodology could also be used in any experiment design and emerges as a feasibility of automatic process optimization.

机译：在拍照过程开发中，仿真在曝光晶片之前优化照片状况非常重要。在本报告中，我们将解决系统方法，以通过统计方法的辅助仿真来加速照片条件优化。此外，这种系统方法也可用于任何实验设计，并作为自动过程优化的可行性出现。

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来源
《Conference on optical microlithography》|2004年||共10页
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作者
Irene Yi-Ju Su; Rachel Huang; Tahone Yang; Kevin Tu; Smith Peng; Chih-Yuan Lu; SPIE-The International Society for Optical Engineering; SPIE v.5377 pt.2;
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正文语种
中图分类石版印刷;
关键词
simulation; optimization; statistics; orthogonal latin hypercube sampling;

机译：仿真;优化;统计;正交拉丁超立体采样;

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Novel methodology for photo condition optimization through simulation

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