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首页> 外文会议>International Conference on Multi-Material Micro Manufacture >High Density Oxygen Plasma Micro-Texturing into CVD-Diamond Coated Dies for Micro-Embossing
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High Density Oxygen Plasma Micro-Texturing into CVD-Diamond Coated Dies for Micro-Embossing

机译：高密度氧等离子体微型纹理成CVD-金刚石涂层用于微压花的模具

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摘要

Diamond coating had been applied as a new candidate material for MEMS and NEMS besides the protective coating of tools and dies. Micro-texturing became a key technology to build up the micro- and nano-structures into diamond films for application to sensors and devices. High density oxygen plasma etching method was developed as a tool to construct any tailored micro-textures into the CVD diamond coating. First, the quantitative plasma diagnosis was utilized to describe the plasma state suitable for this micro-texturing via the etching process. In second, the CVD-diamond coated WC (Co) substrates were prepared to imprint the initial two dimensional micro-dot patterns by the ink-jet printer. The diameter of micro-dots as well as their spatial alignment in printing was varied to investigate the geometric resolution of oxygen plasma etching. Optical microscope, SEM and Raman spectroscopy were utilized to make quantitative characterization on the etched micro-textures into the diamond films. Laser-microscope as well as surface profilometer was also used to describe the geometry and dimension of micro-groove and micro-disc patterns on the diamond-coated WC (Co) substrates.
机译：除了工具和模具的保护涂层之外，金刚石涂层已作为MEMS和NEM的新候选材料。微纹理成为将微型和纳米结构建立成金刚石薄膜的关键技术，以应用于传感器和设备。高密度氧等离子体蚀刻方法被开发为将任何定制的微纹理构建到CVD金刚石涂层中的工具。首先，利用定量等离子体诊断来描述通过蚀刻工艺适用于这种微纹理的等离子体状态。第二，CVD-金刚石涂覆的WC（CO）衬底准备通过喷墨打印机印记初始二维微点图案。改变了微点的直径以及它们在印刷中的空间对准，以研究氧等离子体蚀刻的几何分辨率。光学显微镜，SEM和拉曼光谱分辨率用于在蚀刻的微纹理中进行定量表征到金刚石薄膜中。激光显微镜以及表面轮廓仪还用于描述金刚石涂层WC（CO）基材上的微槽和微盘图案的​​几何和尺寸。

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