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ELECTRODEPOSITED MAGNETIC THIN FILM HEADS: A QUANTUM JUMP FOR MAGNETIC RECORDING; IMMENSE IMPACT ON DEVELOPMENT OF ELECTROCHEMICAL TECHNOLOGY

机译:电沉积磁性薄膜头:磁记录的量子跳跃;巨大影响电化学技术的发展

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In 1957 the read-write heads in IBM's first disk drive system used ferrite yokes individually wound with thin copper wire. The introduction of electroplated thin film batch fabricated heads in 1979 was the first major paradigm shift in the commercial fabrication of inductive heads and resulted in an order of magnitude increase of bit density, faster data access, and smaller, less expensive systems. A second paradigm shift in 1989 introduced integrated MR read, inductive-write heads and enabled even more rapid improvements in performance along with continued decreases in size and cost. The fabrication process for the electroplated heads, which is based on a combination of thin sputtered seed layers, high aspect ratio lithography and novel concepts in electrochemical technology, proved so extendable mat it was carried over in the second paradigm shift. It remains the basis of magnetic head fabrication today and will also be the underlying technology for perpendicular recording heads. The success of electroplated thin film heads led to new recognition for the capabilities of electrodeposition and for the interdisciplinary approach used in developing the manufacturing process. Electrodeposition has become a technology based on predictable science and engineering capable of tailoring material properties to specific requirements and is the process of choice for a broad range of applications both within and beyond electronics. As we approach the limits of longitudinal recording, we are on the verge of a third paradigm shift to perpendicular recording. We expect the manufacture of perpendicular recording heads will continue to be based on the highly extendable technology introduced for the original thin film head.
机译:1957年,IBM的第一个磁盘驱动系统中的读写头使用了用薄铜线单独卷绕的铁氧体轭。 1979年引入电镀薄膜批量制造的头部是电感头商业制造中的第一个主要范式偏移,并导致比特密度增加,更快的数据访问,更小,更便宜的系统。 1989年的第二次范式换档引入了综合MR读取,电感写入头,并且在持续的尺寸和成本方面的性能方面的更快提高甚至更快地提高。电镀头的制造方法,其基于薄溅射的种子层,高纵横比光刻和电化学技术的新概念的组合,证明了如此可伸展的垫在第二个范例偏移中进行。它仍然是当今磁头制造的基础,也将是垂直记录头的底层技术。电镀薄膜头的成功导致了对电沉积能力的新识别以及用于开发制造过程的跨学科方法。电沉积已成为一种基于可预测的科学和工程的技术,能够对特定要求定制材料特性,并且是在电子产品内外广泛应用的选择过程。当我们接近纵向记录的极限时,我们正处于第三个范例转移到垂直录制。我们预计垂直记录头的制造将继续基于为原始薄膜头引入的高度可扩展技术。

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