Negative ion chemistry of simple organogermanes and gas-phase synthesis of novel Ge-anions by IRMPD

机译：IRMPD的简单有机合金属和气相合成的负离子化学

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Organo-germanium compounds play an important role in the chemistry of a variety of new materials ranging from microelectronic devices to zeolite-like templates. Understanding the gas-phase chemistry of simple organogermanes is particularly important for controlling the outcome of chemical vapor deposition (CVD) processes. Likewise, understanding the fundamental reactivity of metal alkoxides, such as Ge(OR)4, is timely because of their increasing use as precursor of sol-gel processes leading to the synthesis of advanced materials and ceramics. The mechanisms of the reactions involved in these processes as well as possible intermediates are poorly characterized because of the complexity of the systems that eventually lead to polycondensation products. This presentation focuses on the gas-phase ion/molecule reaction of simple negative ions acting as nucleophiles with some common organogermanes.

机译：有机锗化合物在各种新材料的化学作用中起重要作用，从微电子器件到沸石样模板。理解简单的有机锰的气相化学对控制化学气相沉积（CVD）方法的结果尤为重要。同样地，了解金属醇盐的基本反应性，例如Ge（或）4，是由于它们随着溶胶 - 凝胶方法的前体的增加而导致了先进材料和陶瓷的原料。由于最终导致缩聚产物的系统的复杂性，所涉及的这些方法以及可能的中间体所涉及的反应的机制表现不佳。该介绍侧重于简单的负离子的气相离子/分子反应作为具有一些常见有机合金的亲核试剂。

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《ASMS Conference on Mass Spectrometry and Allied Topics》|2006年||共2页
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Jose M. Riveros; Luciano A. Xavier; Nelson H. Morgon;
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中图分类 TB994.5-53;
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机译：XGe（OEt）_4〜-离子的顺序IRMPD：气相合成新型氧锗阴离子
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Negative ion chemistry of simple organogermanes and gas-phase synthesis of novel Ge-anions by IRMPD

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