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Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

机译:可见,近红外和短波红外光谱的薄膜吸收器

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In this study, the refractive indices were determined for Al_2O_3 films deposited with ALD, and amorphous Mo-Si-N films deposited with reactive sputtering. The measurements were made by spectroscopic reflectometry, ellipsometry, gonioreflectometry, and double-beam transfer standard spectrometry. Based on the results, two thin film absorbers were designed and manufactured: one for wavelengths of 350…1000 nm, the other for wavelengths of 1200…2000 nm. The manufactured absorbers showed high absorption over their whole working spectra varying from 93.4% at the minimum to 99.9% at the maximum. One of the absorbers was applied to a MEMS thermopile detector with successful process integration.
机译:在该研究中,测定沉积有ALD的AL_2O_3膜和沉积有反应溅射的无定形MO-Si-N膜的折射率。通过光谱反射率,椭偏测量,GONIOREFORCTRY和双光束传递标准光谱法进行测量。基于该结果,设计和制造了两种薄膜吸收剂:波长为350 ... 1000nm,另一个用于1200 ... 2000nm的波长。制造的吸收剂在其整个工作光谱上显示出高的吸收,在最大值的93.4%下变化至99.9%。其中一个吸收剂用于具有成功的工艺集成的MEMS热电堆检测器。

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