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DRASTIC CHANGE IN THE GaN FILM QUALITY BY IN-SITU CONTROLLING SURFACE RECONSTRUCTIONS IN GSMBE

机译:通过原位控制GASMBE控制表面重建的GAN薄膜质量的剧烈变化

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GaN growth was performed on 6H-SiC (0001) substrates by gas-source molecular beam epitaxy (GSMBE), using ammonia (NH_3) as a nitrogen source. Two kinds of reflection high-energy electron diffraction (RHEED) patterns, named (1×1) and (2×2), were observed during the GaN growth depending on the growth conditions. By careful RHEED study, it was verified that the (1×1) pattern was corresponded to a H_2-related nitrogen-rich surface, while (2×2) pattern was resulted from a Ga-rich surface. By x-ray diffraction (XRD), photoluminescence (PL) and atomic force microscopy (AFM) characterizations, it was found that the GaN quality changed drastically grown under different RHEED patterns. GaN film grown under the (1×1) RHEED pattern showed much better qualities than that grown under the (2×2) one.
机译:通过气源分子束外延(GSMBE)在6H-SiC(0001)基材上进行GaN生长,使用氨(NH_3)作为氮源。根据生长条件,在GaN生长期间观察到两种反射高能电子衍射(RHEED)图案,命名(1×1)和(2×2)。通过仔细的RHEEED研究,验证(1×1)模式对应于H_2相关的富氮表面,而(2×2)图案是由富含GA的表面产生的。通过X射线衍射(XRD),光致发光(PL)和原子力显微镜(AFM)表征,发现GaN质量在不同的RHEED模式下大大变化。 GaN膜在(1×1)raweed模式下成长,比在(2×2)下方种植得多的品质更好。

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