Cleaning for sub 0.1mum Technology:a Particular Challenge

机译：SUB 0.1MUM技术的清洁：特定的挑战

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One of the major challenges in surface preparation technology that can impact the yield of sub 0.1-mum devices is particle addition and removal.The attribution of the cleaning process to the total number of particles on the wafer is currently underestimated.Cleaning processes are deemed to remove particles,but they also add particles.

机译：可以影响亚0.1毫米器件的产量的表面制备技术中的一个主要挑战是颗粒添加和移除。清洁过程的归属于晶片上的颗粒总数的归因被低估。切入过程被认为是除去颗粒，但它们也添加颗粒。

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《The Meeting of the Electrochemical Society》|2003年||共1页
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D.Martin Knotter;
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Cleaning for sub 0.1mum Technology:a Particular Challenge

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