• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Meeting of the Electrochemical Society >Effect of Substrates on Structural Properties of Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition
【24h】

Effect of Substrates on Structural Properties of Pure Anatase Phase Titanium Dioxide Thin Films Prepared by Mist Chemical Vapor Deposition

机译：基材对雾化学气相沉积纯锐钛矿相钛二氧化钛薄膜结构性能的影响

获取原文
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Mist chemical vapor deposition method was used to synthesize pure anatase phase titanium dioxide thin films on glass, quartz glass, gallium doped zinc oxide film and p-type silicon substrates. The effects of substrates on the structural and optical properties of TiO_2 thin films were investigated. TiO_2 films deposited on all substrates had the same preferred growth along (101) orientation which crystallize in the anatase phase. The films grown on glass and quartz glass showed better crystallinity than those grown on gallium doped zinc oxide film and p-type silicon. From the morphological results, uniform TiO_2 films with roughness below 10 nm were obtained on all substrates. The transmittance of obtained TiO_2 films on transparent substrates was greater than 75% in the visible region.
机译：雾化学气相沉积方法用于在玻璃，石英玻璃，镓掺杂氧化锌和P型硅基板上合成纯锐钛矿相钛薄膜。研究了基材对TiO_2薄膜结构和光学性质的影响。沉积在所有底物上的TiO_2薄膜沿（101）取向具有相同的优选生长，其在锐钛矿相中结晶。在玻璃和石英玻璃上生长的薄膜显示出比在掺杂掺杂的氧化锌膜和p型硅上生长的薄膜。从形态结果，在所有基材上获得均匀的TiO_2致粗糙度低于10nm的薄膜。在透明基板上获得的TiO_2膜的透射率在可见区域中大于75％。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号