• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Conference on advances in neutron scattering instrumentation >Analyses and Simulations of the Spin Echo Small-Angle Neutron Scattering Instrument
【24h】

Analyses and Simulations of the Spin Echo Small-Angle Neutron Scattering Instrument

机译：旋转回波小角中子散射仪的分析与仿真

获取原文
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Spin echo small-angle neutron scattering (SESANS) is a novel technique that measures correlation functions in real space. Recent theoretical study on SESANS has enabled the interpretation of this correlation function. It has also revealed the range of applications and limitations of the SESANS technique. On a two-dimensional SESANS instrument, the experimental correlation function is the pair-distance distribution function of the scattering particle. On a one-dimensional instrument, the correlation function is an integral function of the pair-distance distribution function. SESANS is suitable for studying particles from a nanometer to a few tens of micrometers in size, a range that is similar to that covered by the traditional Bonse-Hart ultrasmall-angle neutron scattering instrument. The greatest advantage of SESANS lies in the fact that it can use divergent neutron beams, thus drastically increasing the counting rate. The resolution of a SESANS instrument is limited by the integrated Larmor precession field and by the neutron wavelength. Because any SESANS instrument will have a limited momentum transfer coverage, truncation errors can result in the measured correlation functions. The effect of the inhomogeneity of the Larmor field can be handled as smearing. On a one-dimensional SESANS instrument, the off-plane scatterings also result in smearing effects.
机译：旋转回波小角度散射（Sesans）是一种测量实际空间中相关函数的新技术。最近对SESAN的理论研究使得对这种相关函数的解释。它还揭示了Sesans技术的应用范围和局限性。在二维筛选仪器上，实验相关函数是散射粒子的一对距离分布函数。在一维仪器上，相关函数是对距离分布函数的整体函数。 Sesans适用于将来自纳米的颗粒学习到几十微米的尺寸，类似于由传统的Bouse-Hart超大角度 - 角中子散射仪器覆盖的范围。 Sesans的最大优势在于它可以使用发散中子束，从而大大增加计数率。 SESANS仪器的分辨率受到综合的马尔乐队预测场和中子波长的限制。由于任何SESANS仪器都有有限的动量转移覆盖，因此截断误差可能导致测量的相关函数。可以将马球场的不均匀性的影响作为涂抹。在一维培育仪器上，脱机散射也导致涂抹效果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号