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Development of a Linear Stitching Interferometric System for Evaluation of Very Large X-ray Synchrotron Radiation Substrates and Mirrors

机译:用于评估非常大的X射线同步辐射基板和镜子的线性拼接干涉系统的研制

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Stitching interferometry, using small-aperture, high-resolution, phase-measuring interferometric systems has been investigated for quite some time now as a metrology technique to obtain surface profiles of oversized optical components and substrates. The technique offers the potential for providing 3D measurements of mirror surfaces with nanometer resolution. The aim of this work is to apply this technique to the specific case of large, flat, grazing-incidence x-ray mirrors, such as those used in beamlines at synchrotron radiation facilities around the world. In the case of x-ray mirrors, obtaining a 3D surface profile can be particularly useful in many instances, for example, in selecting the best reflecting stripe on a mirror surface to be used for undulator beams. The measurement data can be used for simulating and predicting mirror performance under realistic conditions, etc. A fully automated stitching system is currently being developed at the metrology laboratory of the Advanced Photon Source at Argonne National Laboratory. Preliminary tests performed on a 460-mm-long flat float-glass substrate and on a 300-mm-long superpolished silicon substrate, were encouraging. The stitched profiles showed no obvious overlap errors, and the results agree well with those obtained using other techniques.
机译:使用小孔径,高分辨率,相位测量干涉系统的缝合干涉测量现在已经被研究了一段时间,现在是获得超大型光学元件和基板的表面轮廓的计量技术。该技术提供了具有纳米分辨率的镜面3D测量的可能性。这项工作的目的是将该技术应用于大型,平坦的放牧发病率X射线镜的特定情况,例如在世界各地的同步辐射设施的波束线上使用的那些。在X射线镜的情况下,在许多情况下,获得3D表面轮廓可以特别有用,例如,在选择用于波束梁的镜面上的最佳反射条纹。测量数据可用于在现实条件下模拟和预测镜像性能等。目前正在在Argonne National实验室的先进光子源的测量实验室进行全自动拼接系统。在460mm长的浮法 - 玻璃基板上和300mm长的过度磨削的硅衬底上进行的初步试验令人鼓舞。缝合的简档显示出明显的重叠误差,结果与使用其他技术获得的结果很好。

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