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Temperature and Polarization Performance of EUV Silicon Photodiodes

机译:EUV硅光电二极管的温度和极化性能

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The performance characteristics of a silicon photodiode (type AXUV100) were determined using the beamline X24C at the National Synchrotron Light Source. The diode sensitivity was measured in the temperature range of –92° C to +41° C and in the wavelength region of 3.0 nm to 88.2 nm. This work is important for understanding variations of the diode sensitivity in environments that are colder or hotter than ambient room temperature, such as on a spacecraft or under intense synchrotron or laser irradiation. In addition, the sensitivity of a AVUV100 diode with a multilayer interference coating was measured as a function of the polarization of the incident radiation and the angle of incidence. The Mo/Si multilayer coating, when operating at an angle of incidence of 45°, was designed to selectively transmit the P polarized radiation for detection by the underlying diode and to efficiently reflect the S polarization. The results demonstrate the ability to accurately measure the polarization of radiation within the reflectance profile of the multilayer centered at 13.5 nm. By optimizing the transmittance and reflectance profiles of the multilayer coating for the desired wavelength range and angle of incidence, this new multilayer-coated photodiode technique can be used to measure the polarization of incident radiation from solar, astrophysical, synchrotron, or other laboratory sources over a wide range of extreme ultraviolet and soft x-ray wavelengths.
机译:使用国家同步光源光源的光束线X24C测定硅光电二极管(型AXUV100)的性能特性。在-92℃至+ 41℃的温度范围内测量二极管灵敏度,在3.0nm至88.2nm的波长区域中测量。这项工作是用于理解是更冷或更热的比周围室温的环境中,诸如在航天器或下激烈同步加速器或激光照射的二极管灵敏度的变化重要。另外,作为入射辐射和入射角的偏振的函数测量具有多层干涉涂层的AVUV100二极管的灵敏度。当以45°的入射角操作时,Mo / Si多层涂层被设计为选择性地传送P偏振辐射以通过底层二极管检测并有效地反映S极化。结果表明,能够准确地测量多层以13.5nm为中心的多层的反射谱曲线内辐射偏振的能力。通过优化用于所需波长范围和入射角的多层涂层的透射率和反射率和,这种新的多层涂层光电二极管技术可用于测量来自太阳能,天体物理,同步rotron或其他实验室来源的入射辐射的极化广泛的极端紫外线和软X射线波长。

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