Improved EUV Resist Performance through Processing Refinements - (PPT)

机译：通过加工改进改善EUV抗蚀剂性能 - （PPT）

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EUV resist performance can be significantly improved through process refinement. Performance improvements from PEB optimization may include improved process window and lower LER/LWR. Performance improvement metrics appear to fundamentally link PEB improvements to resist blur and development contrast. Surface conditioners may be an effective method to help bridge the gap between observed LER/LWR trends and industry needs. New materials with improved resolution, LER/LWR, and ultrathin film performance have been successfully developed.

机译：通过工艺细化可以显着改善EUV抗蚀剂性能。 PEB优化的性能改进可以包括改进的过程窗口和下层LER / LWR。性能改进度量似乎基本上链接PEB改进以抵抗模糊和发展对比。表面护发素可以是帮助桥接观察到的LER / LWR趋势和行业需求之间的差距的有效方法。成功开发了具有改进的分辨率，LER / LWR和超薄薄膜性能的新材料。

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《International Extreme Ultraviolet Lithography Symposium》|2006年||共22页
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Tom Wallow; Bruno La Fontaine; Richard Sandberg; Ryoung-han Kim; Uzo Okoroanyanwu; Roger Nassar; Kathleen Spear-Alfonso; Jim Thackeray;
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1. Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone [J] . Muthiah Thiyagarajan, Kim Dean, Kenneth E.Gonsalves Journal of Photopolymer Science and Technology . 2005,第6期

机译：基于主干中具有光酸产生剂（PAG）的聚合物的EUV抗蚀剂的改进光刻性能
2. EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner [J] . Anne-Marie Goethals, Philippe Foubert, Kohei Hosoltawa Journal of Photopolymer Science and Technology . 2012,第5期

机译：EUV抵制NXE3100全场扫描仪的过程性能研究
3. EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner [J] . Anne-Marie Goethals, Philippe Foubert, Kohei Hosokawa, Journal of Photopolymer Science and Technology . 2012,第5期

机译：EUV抵制NXE3100全场扫描仪的过程性能研究
4. Improved EUV Resist Performance through Processing Refinements - (PPT) [C] . Tom Wallow, Bruno La Fontaine, Richard Sandberg, International Extreme Ultraviolet Lithography Symposium . 2006

机译：通过加工改进改善EUV抗蚀剂性能 - （PPT）
5. A plan refinement framework for improving process plans interactively and iteratively. [D] . Li, Xiaomin. 2001

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6. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results [O] . Theodore Manouras, Panagiotis Argitis 2020

机译：高敏感性抗蚀性对EUV光刻进行抗衡性：材料设计策略和绩效结果综述
7. EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner [O] . Anne-Marie Goethals, Philippe Foubert, Kohei Hosokawa, 2012

机译：EUV抵抗NXE3100全场扫描仪的过程性能调查
8. An Information Processing Approach to Performance Assessment. III. An Elaboration and Refinement of an Information Processing Performance Battery. [R] . Allen, T. W., Rose, A. M., Kramer, L. J. 1978

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Improved EUV Resist Performance through Processing Refinements - (PPT)

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