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Extragalactic Background Light and Extragalactic Magnetic Fields

机译：胶质背景光和胶质磁场

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VHE γ-rays from distant blazars several hundred Mpc away are attenuated through pair production interactions on extragalactic background light (EBL). Subsequent to their generation, electron/positron pairs proceed to produce γ-rays through IC interactions leading to the development of an electromagnetic (EM) cascade. Due to the deflection of VHE cascade electrons by extragalactic magnetic fields (EGMF), the spectral shape of this arriving γ-ray emission is dependent on the strength of the EGMF. The GeV-TeV spectral shape of blazars has, thus, the potential to probe the EGMF strength along the line of sight to the object. Focusing on the specific example cases of the blazar 1ES 0229+200 and PKS 2155-304, bounds on the EGMF are obtained using both the spectral and angular observational information from the these two blazars.
机译：来自遥远的Blazars的VHEγ射线通过对丙型术背景灯（EBL）的对生产相互作用进行衰减。在它们的发电之后，电子/正电子对通过IC相互作用进行γ射线，导致电磁（EM）级联的开发。由于VHE级联电子通过丙型磁场（EGMF）的偏转，该到达γ射线发射的光谱形状取决于EGMF的强度。因此，布拉齐的GEV-TEV光谱形状具有沿着视线探测到物体的eGMF强度的可能性。专注于布拉泽1ES 0229 + 200和PKS 2155-304的具体示例情况，使用来自这两个布拉加拉的光谱和角度观测信息获得EGMF的界限。

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