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Electrodeposited anisotropic NiFe 45/55 thin films for high-frequency micro-inductor applications

机译：电沉积各向异性NiFe 45/55用于高频微电感器应用的薄膜

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Micro-inductors, with an electrodeposited nickel-iron core have been fabricated on silicon substrates, and have been characterized in the frequency range up to 100 MHz. The core consists of a nickel iron, 45:55 alloy which is deposited using pulse-reverse electroplating in the presence of a magnetic field to control anisotropy. The operation of the inductors with low loss at high-frequency critically depends on core thickness, which is used to control eddy-current loss as the frequency is increased. However, it is shown that the permeability of NiFe 45/55 has a dependency on thickness, and decreases with increasing thickness. For example, the permeability is measured to be approximately 1000 for a 1-μm-thick film, decreasing to approximately 400 for a 5-μm-thick film. In order to correctly design micro-inductors for operation up to 100 MHz, it is important that this characteristic of the material is taken into account.
机译：微电感器，具有电沉积的镍铁芯，已经在硅基板上制造，并且已经在频率范围内的特征在于高达100MHz。核心由镍铁，45:55合金组成，在磁场存在下使用脉冲反向电镀沉积以控制各向异性。高频损耗低损耗的电感器的操作取决于核心厚度，用于控制频率随着频率而控制涡流损耗。然而，表明NiFe 45/55的渗透性具有厚度依赖性，并且随着厚度的增加而降低。例如，测量渗透率为1μm厚的薄膜的约1000，减少到5μm厚的膜的约400。为了正确设计高达100 MHz的微电感器，重要的是考虑到这些材料的特性。

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