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首页> 外文会议>Symposium on fundamentals of electrochemical growth: from UPD to microstructures - symposium in memory of Prof. Evgeni Budevski >Model of Electrodeposition Stability - Surface Evolution at a Planar Electrode
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Model of Electrodeposition Stability - Surface Evolution at a Planar Electrode

机译：平面电极电沉积稳定性 - 表面演化模型

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摘要

Electrodeposition interfacial phenomena draw attention for scientific interest and for various applications. A common objective is the control of surface feature development from an initially planar or smooth electrode. In some situations, growth is desirable such as the micro- and nano-structures illustrated by Budevski et al. (1). Conditions were discovered to generate nano-scale pyramids on an Ag (100) surface. In other cases, prevention of growth is desired, such as dendritic formations during a steelmaking electrodeposition process (2). Motivation for the present work draws from this latter application. A high temperature (e.g., 1400 °C) steelmaking process involves a cathodic reduction of molten FeO electrolyte to pure Fe metal. The application of DC current can increase the steel production rate by several factors. However, the formation of protrusions on the surface causes short circuiting dendrites, and thus loss of Faradaic efficiency and potentially system failure. Hence, it is desirable to ascertain conditions to maximize the rate of deposition (lowering processing costs) while maintaining dynamically stable uniform growth. Dussault and Powell(3,4) and Pongsaksawad et al.(5,6) developed a phase field model on which the present work is based. However, steady-state profiles were not analyzed, and the dynamic stability analysis only evaluated growth seeded by specific spatial disturbances.
机译：电沉积界面现象引起了科学兴趣和各种应用的关注。共同目标是从最初的平面或平滑电极控制表面特征显影。在某些情况下，期望的增长，例如Budevski等人所示的微型和纳米结构。 （1）。发现病症在Ag（100）表面上产生纳米级金字塔。在其他情况下，需要预防生长，例如铁料电沉积过程中的树突形成（2）。目前工作的动机从后一种应用中抽出。高温（例如，1400°C）炼钢工艺涉及将熔融Feo电解质的阴极还原到纯Fe金属。 DC电流的应用可以通过几个因素提高钢材生产率。然而，表面上的突起形成了短路的枝形轮状，因此丧失了游览效率和潜在的系统故障。因此，期望确定条件以最大化沉积速率（降低处理成本），同时保持动态稳定的均匀生长。 DUSSAULT和POWELL（3,4）和PONGSAKSAWAD等人。（5,6）开发了一个基于当前工作的相位场模型。然而，未分析稳态型材，并且动态稳定性分析仅评估了通过特定空间障碍种植的生长。

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