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Influence of Pulse Duration in Picosecond Laser Ablation of Silicon Nitride Layers

机译:脉冲持续时间在氮化硅层的脉冲持续时间的影响

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Lasers as production tools offer several advantages, which are especially relevant for the production of solar cells. The contact-less and localized nature of the energy deposition allows new processes, such as laser selective emitter doping, laser ablation of dielectric coatings and via drilling for back contact cell concepts. A highly critical factor is the correct selection of laser parameters and thus laser sources in a manner that adapts the laser process to the requirements of the material, the process nature and the solar cell properties. In this paper the influence of the pulse duration in the range from hundreds of femtoseconds to ten picoseconds on the selective ablation of silicon nitride from multi-crytsalline solar cells is investigated. For this process it is critical to avoid damage to the sensitive emitter and ultra-short laser sources have the potential to enable this process.
机译:激光器作为生产工具提供了几个优点,这对于太阳能电池的生产特别相关。能量沉积的接触较少和局部性质允许新的方法,例如激光选择性发射极掺杂,激光烧蚀的介电涂层和钻孔,用于钻孔接触电池概念。一个高度临界因素是正确选择激光参数,从而以适应材料的要求,工艺性质和太阳能电池性能的方式正确选择激光源。在本文中,研究了从数百来自多冻太阳能电池的氮化硅的选择消融的数百毫伏的脉冲持续时间到十几个皮秒。对于此过程,避免敏感发射器损坏和超短激光源的可能性是至关重要的。

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