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Preparation of titanium oxides films by CVD in O2-N2 atmosphere

机译:CVD在O 2 -N 2 气氛中制备氧化钛膜

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The effect of O2 fraction of N2 and O2 on crystalline phases, deposition rates and microstructures of titanium oxides films deposited by laser CVD was studied. With decreasing O2 fraction and increasing laser power, rutile TiO2, anatase TiO2, Ti9O17 and Ti6O11 films were obtained in turn, implying the magneli phase formed easily at high temperature and low O2 fraction. The deposition rates increased with increasing O2 fraction. The films cross-sectional structures became denser with increasing O2 fraction.
机译:N 2 在晶相上的晶相,沉积速率和激光CVD沉积的氧化钛膜的微结构的影响研究过。随着o 2 馏分和增加激光功率,金红石tio 2 ,Anatase TiO 2 ,Ti 9 O < INF> 17 6 O 11又依次获得,暗示在高温下易于形成的Magneli相,低O 2 分数。随着O 2 分数的增加而增加,沉积率增加。薄膜横截面结构随着越来越多的O 2 分数而变得更浓。

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