Research on Coating Devices with Applied Technology in Magnetron Sputtering Regulated Switching Power Supply Design

机译：磁控溅射调节电源设计中应用技术涂布装置研究

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

Magnetron power supply is one of the most important components in coating devices in applied technology. Magnetron regulated power supply with high power and high efficiency is studied and designed on the basis of high-frequency switching power supply technology. The principle of the main circuit and control circuit design are introduced. A MATLAB simulating model is composed to study parameters and waveforms of the designed circuits. The hardware circuit and software program are designed based on simulation results. The adjustment and display of the output voltage and the output current of the power supply under different work modes are achieved with TMS320F2812 DSP system. Practical applications confirm that the designed power supply has good constant current control effect, high reliability and working stability.

机译：磁控电源是应用技术中涂布装置中最重要的组件之一。研究并设计了高功率和高效率的磁控管调节电源，并在高频开关电源技术的基础上设计。介绍了主电路和控制电路设计的原理。 MATLAB模拟模型组成为研究设计电路的参数和波形。基于仿真结果设计了硬件电路和软件程序。通过TMS320F2812 DSP系统实现了不同工作模式下电源输出电压和电源输出电流的调整和显示。实用应用确认，设计的电源具有良好的恒定电流控制效果，可靠性高，工作稳定性。

著录项

来源
《International Conference on Applied Mechanics and Manufacturing System》|2014年||共4页
会议地点
作者
Zhiwen Zhou; Caixia Wang; Anren Ma;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 TH16-53;
关键词
Magnetron sputtering; Switching power supply; DSP;

机译：磁控溅射;开关电源;DSP;

相似文献

外文文献
中文文献
专利

1. CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology [J] . Hovsepian PE, Ehiasarian AP, Ratayski U Surface & Coatings Technology . 2009,第9期

机译：结合高功率脉冲磁控溅射/不平衡磁控溅射（HIPIMS / UBM）技术沉积的CrAlYCN / CrCN纳米多层PVD涂层
2. Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology [J] . Hovsepian PE, Ehiasarian AP, Deeming A, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2008,第11期

机译：结合高功率脉冲磁控溅射/不平衡磁控溅射（HIPIMS / UBM）技术沉积的新型TiAlCN / VCN纳米多层PVD涂层
3. VmeCN Based Nanoscale Multilayer PVD Coatings Deposited by the Combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering Technology [J] . Papken Eh. Hovsepian, Arutiun P. Ehiasarian, Anthony Deeming, Plasma processes and polymers . 2007,第Supplementa1期

机译：高功率脉冲磁控溅射/不平衡磁控溅射技术沉积的基于VmeCN的纳米级多层PVD涂层
4. Research on Coating Devices with Applied Technology in Magnetron Sputtering Regulated Switching Power Supply Design [C] . Zhiwen Zhou, Caixia Wang, Anren Ma International Conference on Applied Mechanics and Manufacturing System . 2014

机译：磁控溅射调节电源设计中应用技术涂布装置研究
5. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering [D] . Ward, Logan 2014

机译：调制脉冲功率磁控溅射沉积氮化钛和氮化铝钛涂层的摩擦学和结构性能
6. The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition [O] . Yan Yonggang, J. G. C. Wolke, Li Yubao, -1

机译：放电功率和热处理对射频磁控溅射沉积磷酸钙涂层的影响
7. Research on Coating Devices with Applied Technology in Magnetron Sputtering Regulated Switching Power Supply Design [O] . Zhiwen Zhou, Caixia Wang, Anren Ma 2016

机译：磁控溅射调节开关电源设计中应用技术的涂层器件研究
8. Power Electronics Technology Applications for Future SSBNs - FY 78. Switching Mode Power Supply Designs are Compatible with Sensitive SSBN Circuits [R] . Kamm, E. 1979

机译：用于未来ssBN的电力电子技术应用 - FY 78.开关模式电源设计与敏感ssBN电路兼容

Research on Coating Devices with Applied Technology in Magnetron Sputtering Regulated Switching Power Supply Design

摘要

著录项

相似文献

相关主题

期刊订阅