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Research of Mask Image's Generation Based on STL Model for Integral Stereolithography System

机译:基于STL模型的积分立体旋转光刻系统STL模型的掩模图像生成研究

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To solve the problem that generation of mask image based on STL model for integral Stereolithography System, a novel method that can generate mask image based on STL model for integral Stereolithography System is proposed. Firstly, contour data is obtained with STL model slicing software; then properties of contour loop's internal and external are determined; and then the order of contour loop's filling is determined; Lastly, the contour loop is filled with the order, and mask image based on STL model can be produced. Generation of mask image is implemented with VC++6.0. The verification result indicates that this method can fill multiple nested contour loops correctly and generate correct mask image for integral Stereolithography System.
机译:为了解决基于STL模型的基于整体立体光刻系统的STL模型来产生掩模图像的问题,提出了一种可以基于基于整体立体旋转光刻系统STL模型产生掩模图像的新方法。首先,使用STL模型切片软件获得轮廓数据;然后确定轮廓环的内部和外部的属性;然后确定轮廓环填充的顺序;最后,轮廓循环填充了订单,并且可以产生基于STL模型的屏蔽图像。使用VC ++ 6.0实现掩模图像的生成。验证结果表明此方法可以正确填充多个嵌套轮廓循环,并为整体立体光刻系统生成正确的掩模图像。

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