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MICROSTRUCTURE AND GROWTH MECHANISM OF SiC WHISKERS SYNTHESIZED BY CARBOTHERMAL REDUCTION OF SILICON NITRIDE

机译:氮化硅碳热还原合成的SiC晶须的微观结构和生长机理

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SiC whiskers were synthesized at 1500°C under argon atmosphere by using Si_3N_4, active carbon and B_2O_3 powders as starting raw materials. The morphology and crystal structure of the synthesized SiC whiskers were characterized by scanning electron microscope, transmission electron microscope and selected-area electron diffraction, respectively. The growth mechanism of the synthesized whisker was discussed. The results show that the synthesized SiC whiskers are β-SiC with the characteristics of single crystal, growing along direction. Two main kinds of morphology are observed, one with the perfect of single crystal growth and the other with obvious stacking faults or micro twins. VS mechanism is the main growth mechanism of SiC whiskers by carbothermal reduction of silicon nitride in this work.
机译:通过使用Si_3N_4,活性炭和B_2O_3粉末作为起始原料,在氩气氛下在1500℃下在1500℃下合成SiC晶须。通过扫描电子显微镜,透射电子显微镜和选定区域电子衍射的特征在于合成的SiC晶须的形态和晶体结构。讨论了合成晶须的生长机制。结果表明,合成的SiC晶须是β-SiC,具有单晶的特性,沿着方向生长。观察到两种主要形态,一个具有单晶生长的完美,另一个具有明显的堆叠故障或微双胞胎。 VS机制是SIC晶须通过在这项工作中的氮化硅碳热还原的主要生长机制。

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