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Electron density topological analysis the intermolecular weak interaction between GeH_4 and X(X=He, Ne, Ar and Kr)

机译:电子密度拓扑分析geh_4和x之间的分子间弱相互作用(x = he,ne,Ar和Kr)

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The intermolecular weak interaction between GeH_4 and X(X=He, Ne, Ar, Kr) has been studied at MP2/aug-cc-pvtz level. Electron density topological properties of the studied systems have been calculated to investigate the critical points of H···X weak bonds. The molecules electrostatic potential (MESP) image is one of the tools for conformational analysis, and the related data suggests the view of the non-electrostatic weak interaction in nature of the GeH_4 X(X=Ar, Kr) systems. To help possible experimental identification of the intermolecular weak interactions described in this work, the frequencies analysis and NMR properties were also calculated at MP2/aug-cc-pvtz level.
机译:在MP2 / AUG-CC-PVTZ水平研究了GEH_4和X(X = HE,NE,AR,KR)之间的分子间弱相互作用。已经计算了研究系统的电子密度拓扑特性,以研究H··X弱键的关键点。分子静电电位(MES)图像是用于构象分析的工具之一,并且相关数据表明GEH_4 X(X = AR,KR)系统的性质本质上的非静电弱相互作用。为了帮助在该工作中描述的分子间弱相互作用的可能实验鉴定,还在MP2 / AUG-CC-PVTZ水平下计算频率分析和NMR性能。

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