首页> 外文会议>Symposium on Carbon Nanostructures 4 - Fullerenes to Graphene >Graphene growth on electrodeposited polycrystalline copper and ruthenium
【24h】

Graphene growth on electrodeposited polycrystalline copper and ruthenium

机译:电沉积多晶铜和钌上的石墨烯生长

获取原文

摘要

Graphene grown by CVD on Cu foils has generated interest due to low cost and the prospect of large-area monolayer coverage. The initial nucleation and growth dynamics of graphene play a critical role in determining the final film quality. In this work, we investigate the effects of the electrochemical synthesis onto graphene quality, showing the influence of the Cu-Ru interdiffusion. The growth of good quality graphene layers is also discussed in terms of the role played by grain boundaries and diffusion at the grain boundaries. This comparison shows that the graphene having the best quality is produced using a ruthenium sandwich covering a copper core. This setting avoids contaminations from evaporation and recondensation of copper during thermal cycling due to the CVD process.
机译:Cu箔上的CVD种植的石墨烯由于低成本和大区域单层覆盖的前景而产生了兴趣。石墨烯的初始成核和生长动态在确定最终薄膜质量方面发挥着关键作用。在这项工作中,我们研究了电化学合成在石墨烯质量上的影响,显示了Cu-ru相互作用的影响。还讨论了良好质量的石墨烯层的增长,也讨论了谷物边界和晶界的扩散的作用。该比较表明,使用覆盖铜芯的钌夹心制造具有最佳质量的石墨烯。由于CVD工艺,该设置避免了在热循环期间铜的蒸发和封闭的污染。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号