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Surface forces in particle technology: Wet systems

机译：粒子技术中的表面力：湿系统

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Surface forces play a fundamental role in particle processing as they control the stability, adhesion, friction and rheology of particulate systems and information on all of these can be obtained from an analysis of the normal forces measured between particles. Therefore particle processing at all stages can be informed by knowledge of the forces between the constituent particles. For wet particles systems, the interaction forces between two particles can rarely be predicted from theory, but rather requires experimentation or direct measurement. This requires that the surfaces used have the same as surface properties as the particles. In practice this is rarely possible, as surface force measurements require surfaces with extremely low roughness and precise geometry and the majority of materials do not conform to these requirements. To address these challenges we produce surfaces of low roughness and controlled chemistry using Atomic Layer Deposition (ALD) and are developing methods to calculate and understand the influence of surface roughness on the measured forces. Here we report the forces between hafhia surfaces produced by ALD and show that like ALD produced titania surfaces and silica surfaces, the expected van der Waals forces at high pH are not manifest, suggesting that most real surfaces have unexpectedly repulsive surface forces at high pH and small separations. This will fundamentally alter how these particulate systems behave when being processed, reducing the adhesion and the friction and enhancing the stability compared to the expected interaction from DLVO theory.
机译：表面力在颗粒处理中起到基本作用，因为它们控制颗粒系统的稳定性，粘附，摩擦和流变学和所有这些的信息可以从颗粒之间测量的正常力的分析获得。因此，可以通过构成颗粒之间的力知识来告知所有阶段的颗粒处理。对于湿颗粒系统，可以从理论上预测两种颗粒之间的相互作用力，而是需要实验或直接测量。这要求使用的表面具有与粒子的表面特性相同。在实践中，这很少可能，因为表面力测量需要具有极低粗糙度和精确的几何形状的表面，并且大部分材料不符合这些要求。为了解决这些挑战，我们使用原子层沉积（ALD）产生低粗糙度和控制化学的表面，并正在开发计算和理解表面粗糙度对测量力的影响的方法。在这里，我们报告hafhia之间的力的表面通过ALD产生，表明类似ALD生产的二氧化钛表面和氧化硅表面，在高pH值的预期范德华力并不明显，这表明最真实的表面在高pH值具有意想不到的排斥表面力和小分离。这将根本改变这些微粒系统在处理时的行为，降低与来自DLVO理论的预期相互作用相比的粘合性和摩擦力和提高稳定性。

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