Critical Parameters of Solution and Process Design for Electrodeposition of Crack Free Cr Coatings – (PPT)

机译：裂纹Cr涂料电沉积溶液和工艺设计的关键参数 - （PPT）

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Same conditions leading to Cr(OH)_3 incorporation are responsible for H_2 evolution and incorporation. These are low values of current efficiency leading to a high interfacial pH values and very negative rest potential of electrode surface during Cr(III) electroreduction leading to a water reduction and generation of large quantities of H_2 at the interface.

机译：导致Cr（oh）_3 Incorpation的相同条件负责H_2演化和掺入。这些是电流效率的低值，导致高界面pH值和电极表面的非常负静息电位在Cr（iii）电荷中导致界面处的水减少和大量H_2的产生。

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《National Association for Surface Finishing Manufacturing Technology Trade Show Conference》|2016年|987p|共15页
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K. Ahmadi; T. Hall; E. J. Taylor; Stanko R. Brankovic;
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中图分类 TG17-53;
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Critical Parameters of Solution and Process Design for Electrodeposition of Crack Free Cr Coatings – (PPT)

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