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首页> 外文会议>Conference on nanobiosystems: Processing, characterization, and applications IX >Deoxyribonucleic acid (DNA)-Ni-Nanostrands composites for EMI shielding
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Deoxyribonucleic acid (DNA)-Ni-Nanostrands composites for EMI shielding

机译：用于EMI屏蔽的脱氧核糖核酸（DNA）-NI-NANOSTRANDS复合材料

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摘要

In this study, we demonstrated the use of DNA-CTMA (DC) in combination with Nickel Nanostrands (NiNs) for application in Electromagnetic Interference (EMI) shielding. The addition of NiNs fillers to DC led to films with higher shielding effectiveness (SE) than when Silver nanoparticles were used. An enhanced EMI shielding effectiveness (SE) was also achieved by the fabrication of the DC-NiNs shielding film structure in a layered architecture. Very thin layer of Guanine (～60 nm) were inserted between layers of DNA-NiNs (～ 100um each) to total a thickness of 500um of the shielding film. An increase of the SE by 6-8 dB for the layered structure as compared to the bulk thick film with NiNs loadings up to 10 wt%. At higher loadings (＞10 wt. %), a significant physical degradation of the films was observed for all films regardless of the thickness or the process of fabrication.
机译：在这项研究中，我们证明使用DNA-CTMA（DC）与镍纳米肌镍（NINS）的组合用于电磁干扰（EMI）屏蔽。将氮气填料加入DC导致具有较高屏蔽效果（SE）的薄膜，而不是使用银纳米颗粒时。通过在分层架构中制造DC-NINS屏蔽膜结构也实现了增强的EMI屏蔽效率（SE）。将非常薄的鸟嘌呤（〜60nm）在DNA-氮的层（每个）的层之间插入到总屏蔽膜的总厚度。与散装厚膜相比，分层结构的SE增加6-8dB的增加，其含有氮气厚度高达10wt％。在更高的载荷（> 10重量％）中，无论制造的厚度或过程如何，都会观察到所有膜的显着物理降解。

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