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首页> 外文会议>Nanobiosystems: Processing, characterization, and applications IX >Deoxyribonucleic acid (DNA)-Ni-Nanostrands composites for EMI shielding
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Deoxyribonucleic acid (DNA)-Ni-Nanostrands composites for EMI shielding

机译：用于EMI屏蔽的脱氧核糖核酸（DNA）-Ni-纳米链复合材料

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摘要

In this study, we demonstrated the use of DNA-CTMA (DC) in combination with Nickel Nanostrands (NiNs) for application in Electromagnetic Interference (EMI) shielding. The addition of NiNs fillers to DC led to films with higher shielding effectiveness (SE) than when Silver nanoparticles were used. An enhanced EMI shielding effectiveness (SE) was also achieved by the fabrication of the DC-NiNs shielding film structure in a layered architecture. Very thin layer of Guanine (～60 nm) were inserted between layers of DNA-NiNs (～ 100um each) to total a thickness of 500um of the shielding film. An increase of the SE by 6-8 dB for the layered structure as compared to the bulk thick film with NiNs loadings up to 10 wt%. At higher loadings (＞10 wt. %), a significant physical degradation of the films was observed for all films regardless of the thickness or the process of fabrication.
机译：在这项研究中，我们证明了将DNA-CTMA（DC）与镍纳米线（NiNs）结合使用在电磁干扰（EMI）屏蔽中的应用。与使用银纳米颗粒时相比，向直流中添加NiNs填充剂可以使薄膜具有更高的屏蔽效果（SE）。通过以分层架构制造DC-NiNs屏蔽膜结构，还可以提高EMI屏蔽效率（SE）。在DNA-NiNs层之间插入非常薄的鸟嘌呤层（约60 nm）（每层约100um），从而形成厚度为500um的屏蔽膜。与NiNs含量高达10 wt％的块状厚膜相比，分层结构的SE增加了6-8 dB。在较高的负载量（＞ 10 wt。％）下，无论厚度或制造工艺如何，所有薄膜均会观察到薄膜的显着物理降解。

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