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Simple and Highly Effective Purification of Metallurgical-Grade Silicon Through Metal-Assisted Chemical Leaching

机译：通过金属辅助化学浸出简单且高效地净化冶金级硅胶

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The present study proposed a simple and highly effective method for removal of impurities from large-sized particle metallurgical-grade silicon (MG-Si) powders based on metal-assisted chemical leaching (MACL). The various leaching approaches (MACL, HF + H_2O_2 leaching, HF leaching, HCl leaching) were investigated for leaching behaviors of the main impurities (Fe, Al, Ca, Ti, Ni, V, Mn, and Cu). The leaching results show that the order of impurities' removal efficiency, from highest to lowest, is MACL > HF - H_2O_2 leaching > HF leaching > HCl leaching. After MACL, The numerous micro-scale "channels" introduced by MACL which are beneficial for the removal of impurities, especially for the non-dissolving metal impurities, such as copper, calcium, and aluminum. It should be noted that the small amount of Cu mainly come from residual Cu nanoparticle and can be removed by simple acid washing.
机译：本研究提出了一种简单且高效的方法，用于基于金属辅助化学浸出（MAC1），从大型颗粒冶金级硅（Mg-Si）粉末中除去杂质的简单且高效的方法。研究了各种浸出方法（Mac1，HF + H_2O_2浸出，HF浸出，HCl浸出），用于浸出主要杂质的行为（Fe，Al，Ca，Ti，Ni，V，Mn和Cu）。浸出结果表明，从最高到最低的杂质去除效率的顺序是MACL> HF - H_2O_2浸出> HF浸出> HCl浸出。在MAC1之后，通过MAC1引入的许多微刻度“通道”，这些微级“通道”是有益的，用于去除杂质，特别是对于非溶解金属杂质，例如铜，钙和铝。应注意，少量Cu主要来自残留的Cu纳米粒子，可以通过简单的酸洗除去。

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