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首页> 外文会议>International Symposium on Current Progress in Mathematics and Sciences >Effect of Post-Thermal Annealing on the Structural of ZnO Thin Films Deposited Using Sol-Gel Spin-Coating Method
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Effect of Post-Thermal Annealing on the Structural of ZnO Thin Films Deposited Using Sol-Gel Spin-Coating Method

机译：用溶胶 - 凝胶旋转涂布法沉积ZnO薄膜结构后热退火的影响

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ZnO thin film was deposited on a coming glass substrate using a sol-gel spin-coating method. The effect of post-thermal annealing on the structural of ZnO thin film was determined using scanning electron microscopy (SEM) and X-ray diffraction (XRD) measurements. The results showed that the films thickness was around 320 nm with polycrystalline hexagonal wurtzite structure. From the XRD measurement, it was found that the (002) diffraction peak increases by the increase of post-thermal annealing. It indicated that the films grow along the c-axis with a preferential orientation of (002). The calculation of all parameters from the XRD data, such as texture coefficient (TC), crystalline size (D), lattice strain (ε), dislocation density (p) indicated that the post-thermal annealing significantly affect the crystalline structures.
机译：使用溶胶 - 凝胶旋涂法在即将到来的玻璃基板上沉积ZnO薄膜。使用扫描电子显微镜（SEM）和X射线衍射（XRD）测量测定热退火后热退火对ZnO薄膜结构的影响。结果表明，薄膜厚度约为320nm，具有多晶六边形紫硝基钛矿结构。从XRD测量开始，发现（002）衍射峰值随着后热退火的增加而增加。它表明，薄膜沿着C轴生长，具有（002）的优先取向。从XRD数据计算的所有参数，例如纹理系数（Tc），晶体尺寸（d），晶格菌株（ε），位错密度（p）表明后热退火显着影响结晶结构。

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