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Analysis of metrological properties of the measurement system to study changes in the resistance of nanocomposite carbon-palladium thin films under the influence of hydrogen

机译:测量系统的计量性质分析研究氢气影响下纳米复合碳 - 钯薄膜电阻的变化

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Nanocomposite carbon-palladium thin films were prepared by PVD method on ceramic (Al_2O_3) substrates by our group at Tele & Research Institute in Warsaw. Resistance of these films changed under the influence of hydrogen at different concentration of this gas. Set-up for measurements of resistance changes due to gas influence was designed and built. The set-up is composed of measurement chamber, gas flow controllers, valves and specially devoted to this experiment computer system with SkSysM program developed by the author. In this paper, the measurement system and its metrological properties are described. The uncertainty of measurement of the system during experimental procedure of resistance changes measurements for C-Pd films under influence of hydrogen is described. The uncertainty of measurements, illustrated with the experimental errors for dynamic and static conditions of experiment is also discussed.
机译:通过PVD方法在华沙省Tele和Research Countitute的陶瓷(Al_2O_3)基质上通过PVD方法制备纳米复合碳 - 钯薄膜。这些薄膜的电阻在不同浓度的这种气体中的影响下改变。设计并建造了由于气体影响因阻力而变化的设置。设置由测量室,气体流量控制器,阀门组成,并专门专门专门与作者开发的Sksysm程序的实验计算机系统。在本文中,描述了测量系统及其计量性质。描述了在氢气影响下,描述了在耐氢的抗性变化测量中测量系统的不确定性。还讨论了测量的不确定性,并讨论了实验动态和静态条件的实验误差。

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